Ion Beam Sputter Deposition
Ion Beam Sputter Deposition (IBSD)
Reactive Ion Beam Sputter Deposition (RIBSD)
Ion BeamSputterDeposition (IBSD)
© High-End Thin Film Deposition Process
© Lower Pressure Sputter Deposition (10-4 Torr), Sputtered
Atoms Retain Kinetic Energy Due to Minimal Scatting in Low
Pressure Environments
© High Quality, Smooth, Pin Hole Free Films
© Enhanced Adhesion and Micro-structure Control
© Yields Excellent Coverage at Small Thicknesses and on High
Aspect Ratio Features
© Independent Control of Ion Beam Parameters Allows User to
Engineer Film for Desired Properties
© Low energy ion assist with end-Hall ion sources
© Typically, Film Properties from Ion Beam Deposition Exceed
those Deposited by Evaporation or Magnetron Sputtering
Typical Dual Ion Beam System Configuration
Typical Ion Beam Sputter Deposition System
with ion beam assisted deposition capability for Cluster Tool Configuration
Ion BeamSputterDeposition Applications
Device / Process Materials
Superconductors YBaCuOx, LaSrTiOx
Thin Film Heads NiFe, CrCo
Optical Thin Films Al2O3, Ta2O5, TiO2, SiO2
Ring Laser Gyro Mirrors Multilayer SiO2/TiO2
Dielectric Films SiO2, TiO2, AlN, etc.
Encapsulation Films Si3N4, Al2O3
Anti-reflection Coatings MgF2, SiO2, Ta2O5, TiO2
Interconnect Films W, Au, Cu
Sensors Composites or Alloys
Advanced Magnetic Heads NiFe, Ta, Cu, Co, FeMn
Semiconductor Si3N4, DLC
X-ray Optics W, Cu, Mo, Si, B4C, Ni, C
Laser Facets Si3N4, SiO2, Al2O3, Si
High Reflectance Mirrors Refractory Oxides, Si
Divisional Wave Multiplexers Refractory Oxides, Si
Laser coatings Nb2O5, Ta2O5, HfO2, SiO2
Any necessity or question, Please contact our sales representative.
We will do our best service for you.
