In Line sputtering System

  • product ID:6

  • In Line sputtering System


    Specification:

  • Equipment Overview

    This equipment is horizontal In-line sputter deposition equipment. The equipment is used to deposit metal and oxide coating on glass substrate.

    System configuration

    Characteristic

      (1)  Horizontal sputtering deposition

      (2)   High reliable isolation valve design

      (3)   Uniform gas flow conductance design

     (4)   High target utilization of magnetron cathode design

     (5)   Quick exchanging target design

     (6)   19” TFT panel Human-Machine Interface

     (7)   Alarm history record

     (8)   DC & RF power safety interlock