PLD System

  • product ID:4

  • Plused Laser Deposition System


    Specification:
    PLD Plused Laser Deposition System

  • ●High K Oxide material:Gd203,HrO2,HfO2,LaALO3,SrTIO2,etc.
    ●High Tc superconductors:YBCO
    ●RAM potential material:TiO2,BaTiO3,etc.
    ●Oxide Semiconductor:ZnO/ZnMgO,Cu2O,CuAlo3,etc.
    ●Ferroelectric oxide.
    ●Ⅲ-Nitride:AIN InN,GaN.
    ●Advanced material development

    Stoichiometry

    Target composition is preserved in the film

    Pressure and temperature range

    Large dynamic range of process gases and pressure (1 *10-10 torr to 1 torr)

    Multilayers

    Complex multilayer thin films can be deposited in a single deposition run.

    LJ UHV PLD system Specification

    　 Model Pilot 320 Pilot 320L Pilot 400 Pilot 400L
    Standard component Deposition chamber dimension Φ320mm Φ320mm Φ400mm Φ400mm
    Load-lock chamber dimension NA Φ200mm NA Φ200mm
    Substrate diameter 1" 1" 2" 2"
    Targets  1" diam. × 4 1" diam. × 4 1" diam. × 4 1" diam. × 4
    Heater dimension 2" 2" 3" 3"
    Deposition chamber base pressure < 5*10-7 Torr < 5*10-9 Torr < 5*10-7 Torr < 5*10-9 Torr
    Main vacuum pump  260 liters/sec 260 liters/sec 400 liters/sec 400 liters/sec
    Computer control Yes Yes Yes Yes
    　 　 　 　 　 　
    Optional Heater temperature 400℃, 600℃, 800℃, 1000℃ by customer request
    Laser System  by customer request
    Target Load-lock Optional Optional Optional Optional
    Auto-pressure control(APC) Optional Optional Optional Optional
    520 liter/sec pumping package Optional Optional Optional Optional
    Scanning-Laser-Beam delivery Optional Optional Optional Optional
    Ion-Beam-Assisted deposition Optional Optional Optional Optional
    High-Pressure RHEED Optional Optional Optional Optional
    Wafer auto-transfer Optional Optional Optional Optional
    Shutter function Optional Optional Optional Optional

     

     The Advantage of PLD:

    Stoichiometry:

    A Laser beam vaporizes a target surface, producing a film with the same composition as the target.

    Versatile:

    Many materials can be deposited in a wide veriety of gases over a broad range of gase pressure.

    Cost-effective:

    One Laser can serve many vacuum systems

    Chamber and Plume

     Laser Plume

    PLD introduction (Please click here for more information）

    More information (Please click here for more information）