Chemical vapor deposition CVD

  • product ID:105

  • PECVD


    Specification:
    Substrate size: 300 * 300 mm nine gases input RF Power: 13.56 MHz 1000W

  • Plasma Enhance Chemical vapor deposition System

    PECVD

    P300 System outlook

    outlook 2

     

     

    Plasma generation

    Plasma

     

    System control

    Main control screen

    Processibg Parameter setting

    Processing monitor

    Abrormity display

    System maintenance