E-Beam System
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- product ID:80
UHV E-Beam System
Specification:
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Evaporation system
Type Evaporation
E-Beam
Thermal
single 20 cc 3×200A ( 15V) 4×7 cc 3KW 3KW 6KW Ultimate pressure 5×10-7 5×10-7 (Torr ) 5×10-9 5×10-9 Pressure Control Option option Follow Option Option Control Heating 400 ℃ 400 ℃ Substrate 2" 2" Base 3" 3" 4" 4" 6" 6" 2"×5 pcs 2"×5 pcs Rotation 30 - 120 rpm 30 - 120 rpm Deposition assisted Ion-assisted Ion-assisted ION 3 cm ION 3 cm Plasma clean Plasma clean Base Bias Base bias Load-lock Option Option ≧3" ≧3" 2" multi-pieces 2" multi-pieces Manual/Auto Manual/Auto Control PLC+Manual PLC+Manual PLC+PC PLC+PC Function Control Vacuum:Auto/Semi-auto Vacuum:Auto/Semi-auto Process:Manual/Auto Process:Manual/Auto Record & Monitor:option Record & Monitor:option (Option) (Option) Safety Safety Valve Pneumatic Pneumatic Control Vacuum Gauge Ion/Cold-Cathode/TC. Ion/Cold-Cathode/TC. Digital Display Digital Display Rack Instrument and Control System integrated Instrument and Control System integrated We have many experiences in this kind of equipments,
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