Sputtering Cathode

  • product ID:29

  • φ3 Magnetron Sputtering Cathode


    Specification:
    Compact and high cooling efficiency UHV compatible to 1 * 10-8 torr Can be used on Iron, Cobalt, Nickel Shutter function optional. Easy to change the target material

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    Specifications  

    Sputtering Gun  

     Target size  

    3 inches diameter 

     Target thickness

    Less than 6.35 mm

     Mounting

    3/4” Quick coupler May be mounted in top of chamber, in the baseplate, or in a feedthrough collar. Gun will operate in any orientation 

     Power Required

    Maximum 1000 watts, 13.56Mhz RF or maximum 2000 watts DC.

     Shutter function

    Included

    Preventing impurity material sputtering on the wafer surface 

    Cathode Voltage 

    200 – 1500 volts 

    Cooling Method 

    indirect 

    Cooling Water 

    0.3 GPM 

    Cooling Water Resistivity 

    RF 5 MΩ, Minimum 

    DC 3 MΩ, Minimum 

    Target Geometry 

    Circular disk  

    Target Mounting 

    Screw 

    Overall High 

    200 mm 

    Largest diameter 

    95 mm 

    Normal operating pressure 

    1 - 400 mTtorr 

    Vacuum 

    Range 

    1x10-8 Torr 

     Leak Test 

    2×10-10 cc/sec of He 

    Cooling Water 

    Flow Rate 

    0.2 to 0.5 gal/min 

    Temperature 

    18℃ to 32℃ 

    Pressure 

    30 to 40 PSI 

    Shutter function is optional

     

     

    Specifiction  (Please click me)