Sputtering System

  • product ID:23

  • UHV Sputtering System


    Specification:

  • Features:

      Compact and module design
    �HV/UHV conditional
    �Semi auto/Auto system control

     

    Sputter cathode and Power

    Sputtering System

    cathode
     1  cathode ( 2" ) expandable to 4 cathodes
    DC 500W/1KW
    ★RF 500W(option)
    　
    Ultimate pressure(Torr ) 　
    5×10-7 
    ★5×10-9 (option)
    Pressure Control Bypass control
    ★ＡＰＣ (PM5 Set)
    Mass Follow Control ＭＦＣ
    Ar   100 cc/min
    O2   50 cc/min
    Heater 400 ℃
    ★600 ℃
    ★800 ℃
    Substrate               Holder 2" 
    ★3" 
    ★2"×3 pieces
    　
    Rotation speed 30 - 120 rpm
    Assistance ★Ion source  3 cm
    ★Plasma clean
    ★Base bias
    Load-lock chamber Option
    ★≧3"
    ★2"多片
    　
    System Control ＰＬＣ＋interface
    ★ＰＬＣ＋ＰＣ
    　
    Function Control Vacuum  Semi-auto/Auto
    ★Process　Manual/Auto (Option)
    ★Record and Monitor(Option)
    Safety
    Valves control pneumatic control
    Vacuum Gauge Ion/Cold cathode/TC
    Digital display
    Rack instruments and control system integrated
    ★ is Optional item

    If you interest in this kinds of machine,

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